Lithography at 248 nanometers (KrF) – Product is not sold in Germany

These lithography optics systems are based on the use of deep ultraviolet light (DUV) with a wavelength of 248 nanometers. The light wavelength is generated by an excimer laser with krypton fluoride (KrF).

Starlith? 860

The ZEISS Starlith 860 lithography optics system is one of the best-selling optics systems made by the Semiconductor Manufacturing Technology business group at ZEISS. With an exposure wavelength of 248 nanometers it facilitates resolutions between 110 and 90 nanometers today.

Starlith? 1000

The ZEISS Starlith 1000 is likewise a volume product. It works at a wavelength of 248 nanometers and achieves resolution of down to 80 nanometers.